Role of the tip induced local anodic oxidation in the conductive atomic force microscopy of mixed phase silicon thin films

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 7, Issue 3-4, 2010, Pages 728-731

  Vetushka, Aliaksei ^a   Fejfar, Antonín ^a   Ledinský, Martin ^a   Rezek, Bohuslav ^a   Stuchlík, Jiří ^a   Kočka, Jan ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; AMBIENT ATMOSPHERE; CONDUCTIVE ATOMIC FORCE MICROSCOPY; CURRENT IMAGE; CURRENT LEVELS; GRAIN EDGES; HF ACID; IN-SITU; LOCAL ANODIC OXIDATION; MICROCRYSTALLINE SILICON THIN FILMS; MIXED PHASE; PRISTINE SURFACES; SAMPLE BIAS; SCAN LINE; SI SURFACES; SILICON THIN FILM; SURFACE OXIDE; TIP-INDUCED; TOPOGRAPHIC CHANGES;

ATOMIC FORCE MICROSCOPY; CONDUCTIVE FILMS; MICROCRYSTALLINE SILICON; OXIDE FILMS; RESTORATION; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS;

ANODIC OXIDATION;

EID: 77952560129     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200982777     Document Type: Conference Paper

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