Electronic and topographic properties of amorphous and microcrystalline silicon thin films

Thin Solid Films

Volumn 383, Issue 1-2, 2001, Pages 57-60

  Kleider, J P ^a   Longeaud, C ^a   Bruggemann R ^a   Houze F ^a  

^a UNIV PARIS SUD   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; DEGRADATION; DIFFUSION IN SOLIDS; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRONIC PROPERTIES; FILM PREPARATION; HYDROGENATION; NANOSTRUCTURED MATERIALS; SEMICONDUCTING SILICON; SURFACE ROUGHNESS; THIN FILMS;

MICROCRYSTALLINE SILICON;

SEMICONDUCTING FILMS;

EID: 0035246860     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01614-X     Document Type: Article

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