Localized oxidation influence from conductive atomic force microscope measurement on nano-scale I-V characterization of silicon thin film solar cells

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 588-592

  Shen, Zhenhua ^a   Eguchi, Mototaka ^a   Gotoh, Tamihiro ^b   Yoshida, Norimitsu ^a   Itoh, Takashi ^a   Nonomura, Shuichi ^a  

^a GIFU UNIVERSITY   (Japan)

^b GUNMA UNIVERSITY   (Japan)

Author keywords

Conductive AFM; I V characteristic; Local oxidation; Modification; Solar cells

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; MICROCRYSTALLINE SILICON; OXIDATION; THIN FILMS;

CONDUCTIVE ATOMIC FORCE MICROSCOPE; LOCAL OXIDATION; TOPOGRAPHICAL AND CURRENT-VOLTAGE IMAGING (TCVI);

SOLAR CELLS;

EID: 36749036057     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.198     Document Type: Article

References (10)

1. Rezek B., Stuchlik J., Fejfar A., and Kocka J. J. Appl. Phys. 92 (2002) 587
2. Natsuhara H., Ohashi T., Ogawa S., Yoshida N., Itoh T., Nonomura S., Fukawa M., and Sato K. Thin Solid Films 430 (2003) 253
3. Shen Z., Eguchi M., Ogawa S., Gotoh T., Sato K., Itoh T., Yoshida N., and Nonomura S. Proceedings of 15th International Photovoltaic Science and Engineering Conference, Shanghai, China, October 10-15 (2005) 481
4. Gu J., Zhou Y., Zhu M., Liu F., and Liu J. J. Cryst. Growth 285 (2005) 491
5. Ogawa S., Takai Y., Natsuhara H., Futamura A., Okabe M., Itoh T., Yoshida N., and Nonomura S. Proceedings of 15th International Photovoltaic Science and Engineering Conference, Shanghai, China, October 10-15 (2005) 1138
6. The contact diameter between an rhodium-coated cantilever and p-layer of μc-Si:H surface can be estimated at ∼ 0.5 nm according to the Hertz equation in A. Bietsch, M. Alexander Schneider, M. Bruno. J. Vac. Sci. Technol., B 18 (2000) 1160
7. Kleider J.P., Longeaud C., Bruggemann R., and Houze F. Thin Solid Films 383 (2001) 57
8. Hu X.-D., and Hu X.-T. Ultramicroscopy 105 (2005) 57
9. Dagata J.A., Inoue T., Itoh J., and Yokoyama H. Appl. Phys. Lett. 73 (1998) 271
10. Dubois E., and Bubendorff J.-L. J. Appl. Phys. 87 (2000) 8148