Crystal growth of polycrystalline silicon thin films for solar cells evaluated by scanning probe microscopy

Journal of Non-Crystalline Solids

Volumn 338-340, Issue 1 SPEC. ISS., 2004, Pages 682-685

  Muhida, R ^a,c   Kawamura, T ^a   Harano, T ^a   Okajima, M ^a   Toyama, T ^a   Okamoto, H ^a   Honda, S ^b   Takakura, H ^b   Hamakawa, Y ^b  

^a OSAKA UNIVERSITY   (Japan)

^b RITSUMEIKAN UNIVERSITY   (Japan)

^c INTERNATIONAL ISLAMIC UNIVERSITY MALAYSIA   (Malaysia)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; DEPOSITION; DOPING (ADDITIVES); MOLECULAR STRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SOLAR CELLS; SYNTHESIS (CHEMICAL);

CARRIER TRANSPORT; DEPOSITION TEMPERATURE; SCANNING PROBE MICROSCOPE; VERY HIGH FREQUENCY;

THIN FILMS;

EID: 2942560552     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.03.065     Document Type: Conference Paper

References (9)

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