Detailed structural study of low temperature mixed-phase Si films by X-TEM and ambient conductive AFM

Journal of Non-Crystalline Solids

Volumn 352, Issue 9-20 SPEC. ISS., 2006, Pages 1011-1015

  Mates, T ^a   Bronsveld, P C P ^b   Fejfar, A ^a   Rezek, B ^a   Kocka J ^a   Rath, J K ^b   Schropp, R E I ^b  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b UTRECHT UNIVERSITY   (Netherlands)

Author keywords

Atomic force and scanning tunneling microscopy; Plasma deposition; Silicon; Solar cells; TEM STEM

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC CONDUCTIVITY; PLASMAS; SCANNING TUNNELING MICROSCOPY; SOLAR CELLS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

CURRENT DETECTION; MICROCRYSTALLINE SILICON; PLASMA DEPOSITION; SURFACE CORRUGATION; SURFACE NATIVE OXIDE; TOPOGRAPHY;

SILICON;

EID: 33745448427     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.10.058     Document Type: Article

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