Charge storage in undoped hydrogenated amorphous silicon by ambient atomic force microscopy

Applied Physics Letters

Volumn 83, Issue 9, 2003, Pages 1764-1766

  Rezek, B ^a   Mates, T ^a,b   Stuchlik J ^a,b   Kocka J ^a,b   Stemmer, A ^a  

^a ETH ZURICH   (Switzerland)

^b INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANODIC OXIDATION; ATOMIC FORCE MICROSCOPY; CHARGED PARTICLES; FERMI LEVEL; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

CHARGE STORAGE;

SILANES;

EID: 0141831149     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1606872     Document Type: Article

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