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Volumn 90, Issue 9, 2001, Pages 4532-4542

(Ta1-xNbx)2O5 films produced by atomic layer deposition: Temperature dependent dielectric spectroscopy and room-temperature I-V characteristics

(5) Stromme M a Niklasson, G A a Ritala, M b Leskela M b Kukli, K b,c

a UPPSALA UNIVERSITY (Sweden)

b UNIVERSITY OF HELSINKI (Finland)

c UNIVERSITY OF TARTU (Estonia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0013326965 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1405837 Document Type: Article

Times cited : (23)

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