Enhancement of Ti+ density in high-pressure magnetron sputtering plasmas

Journal of Physics D: Applied Physics

Volumn 43, Issue 12, 2010, Pages

  Sasaki, K ^a   Nafarizal, N ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b UNIVERSITI TUN HUSSEIN ONN MALAYSIA   (Malaysia)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE EXCHANGE COLLISION; DEPOSITION CONDITIONS; DEPOSITION PROFILES; DISCHARGE PRESSURES; DOWNSTREAM REGION; ELECTRON IMPACT-IONIZATION; HIGH-IONIZATION; IONIZATION MECHANISMS; LASER-INDUCED FLUORESCENCE IMAGING; MAGNETRON SPUTTERING PLASMA; PENNING IONIZATION; PRODUCTION PROCESS; SPATIAL DISTRIBUTION; THREE-BODY RECOMBINATION; TI FILM; TITANIUM TARGETS;

CHARGE TRANSFER; ELECTRIC DISCHARGES; MAGNETRON SPUTTERING; MAGNETRONS; PARTICLE DETECTORS; PLASMAS; PRODUCTION ENGINEERING; TITANIUM;

IMPACT IONIZATION;

EID: 77949530459     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/12/124012     Document Type: Article

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