Titanium sputter deposition at low pressures and long throw distances

IEEE Transactions on Semiconductor Manufacturing

Volumn 9, Issue 1, 1996, Pages 122-127

  Broughton, James N ^a   Brett, Michael J ^a   Dew, Steven K ^a   Este, G ^b  

^a UNIVERSITY OF ALBERTA   (Canada)

^b NORTEL NETWORKS   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; PRESSURE EFFECTS; SEMICONDUCTING FILMS; TITANIUM;

DEPOSITION RATES; FILM RESISTIVITY; PINHOLE EXPERIMENTS; THROW DISTANCES;

SPUTTER DEPOSITION;

EID: 0030083512     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.484292     Document Type: Article

References (9)

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