Effects of ionization power on ion energy distribution in ionized r.f. sputtering measured by an energy-resolved mass spectrometer

Surface and Coatings Technology

Volumn 108-109, Issue , 1998, Pages 177-181

  Kusano, E ^a   Kashiwagi, N ^a   Kobayashi, T ^a   Nanto, H ^a   Kinbara, A ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Energy distribution analysis; Inductive r.f. plasma; Ionized PVD; Titanium

Indexed keywords

CATHODES; IONIZATION OF SOLIDS; MASS SPECTROMETRY; PLASMA APPLICATIONS; SPUTTER DEPOSITION; VAPOR DEPOSITION;

ENERGY DISTRIBUTION ANALYSIS; ENERGY-RESOLVED MASS SPECTROMETRY; IONIZED SPUTTERING; PHYSICAL VAPOR DEPOSITION (PVD);

TITANIUM;

EID: 0039774304     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00650-1     Document Type: Article

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