Effects of coil dc potential on ion energy distribution measured by an energy-resolved mass spectrometer in ionized physical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 2360-2363

  Kusano, E ^a   Saitoh, T ^a   Kobayashi, T ^a   Fukushima, K ^a   Kikuchi, N ^a   Nanto, H ^a   Kinbara, A ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONVENTIONAL MAGNETRON SPUTTERING; CURRENT FLOWS; DC POTENTIAL; DC SELF BIAS; ENERGY DISTRIBUTIONS; ENERGY SPECTRA; ENERGY-RESOLVED MASS SPECTROMETER; GROUNDED SUBSTRATES; INDUCTANCE-CAPACITANCE; INDUCTIVE COILS; ION ENERGIES; ION ENERGY DISTRIBUTIONS; IONIZED PHYSICAL VAPOR DEPOSITION; LOWER ENERGIES; PEAK ENERGY; PLASMA CONDITIONS; PLASMA MONITORS; PLASMA POTENTIAL; PROBE MEASUREMENTS; RF COIL; TERMINATION RESISTANCE;

ELECTRIC POWER DISTRIBUTION; FADING (RADIO); ION BEAMS; IONIZATION; IONS; MASS SPECTROMETERS; MASS SPECTROMETRY; PHYSICAL VAPOR DEPOSITION; PLASMA SOURCES; SPECTROSCOPY;

PLASMA DEPOSITION;

EID: 0007038551     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581773     Document Type: Conference Paper

References (7)

1. M. Yamashita, Jpn. J. Appl. Phys., Part 1 26, 721 (1987).
2. M. Yamashita, J. Vac. Sci. Technol. A 7, 151 (1989).
3. S. M. Rossnagel and J. Hopwood, Appl. Phys. Lett. 63, 3285 (1993).
4. S. M. Rossnagel and J. Hopwood, J. Vac. Sci. Technol. B 12,449 (1994).
5. J. Hopwood and F. Qian, J. Appl. Phys. 78, 758 (1995).
6. M. Dickson, F. Qian, and J. Hopwood, J. Vac. Sci. Technol. A 15, 340 (1997).
7. E. Kusano, N. Kashiwagi, T. Kobayashi, H. Nanto, and A. Kinbara, Thin Solid Films 108-109, 177 (1998).