Deposition profile of Ti film inside a trench and its correlation with gas-phase ionization in high-pressure magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 6, 2006, Pages 2206-2211

  Nafarizal, N ^a   Takada, N ^a   Nakamura, K ^b   Sago, Y ^c   Sasaki, K ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b CHUBU UNIVERSITY   (Japan)

^c Canon ANELVA Corporation ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FLUORESCENCE; IONIZATION OF GASES; MAGNETRON SPUTTERING; PRESSURE EFFECTS; SPECTROSCOPIC ANALYSIS;

DEGREE OF IONIZATION; GAS PRESSURE; LASER-INDUCED FLUORESCENCE (LIF) IMAGING SPECTROSCOPY; SPATIAL DISTRIBUTIONS;

THIN FILMS;

EID: 33750932953     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2363999     Document Type: Article

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