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Volumn 19, Issue 5, 2009, Pages 309-329

Controlled III/V nanowire growth by selective-area vapour phase epitaxy

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; GALLIUM ARSENIDE; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; III-V SEMICONDUCTORS; INDIUM ARSENIDE; SCANNING ELECTRON MICROSCOPY; VAPOR PHASE EPITAXY;

EID: 77149128080     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3119555     Document Type: Conference Paper
Times cited : (4)

References (56)
  • 6
    • 77149162618 scopus 로고    scopus 로고
    • International Technology Roadmap for Semiconductors, http://www.itrs.net
  • 43
    • 0041806083 scopus 로고
    • Phys. Rev. B, 48, 17181 (1993);
    • (1993) Phys. Rev. B , vol.48 , pp. 17181
  • 44
    • 0001298490 scopus 로고
    • Phys. Rev. B, 52, 14078 (1995).
    • (1995) Phys. Rev. B , vol.52 , pp. 14078
  • 54
    • 77149146101 scopus 로고    scopus 로고
    • D. Spirkoska, G. Abstreiter and A. F. i Morral, Nanotechnology, 19, 433704 (2008).
    • D. Spirkoska, G. Abstreiter and A. F. i Morral, Nanotechnology, 19, 433704 (2008).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.