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Journal of Materials Chemistry

Volumn 18, Issue 43, 2008, Pages 5187-5189

In situ generation of indium catalysts to grow crystalline silicon nanowires at low temperature on ITO

(5) Alet, Pierre Jean a,b Yu, Linwei b Patriarche, Gilles c Palacin, Serge a Roca Cabarrocas, Pere b

a CNRS UMR 3299 (France)

b LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES (France)

c UNIV PARIS SUD (France)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSTS; CRYSTALLINE MATERIALS; INDIUM; NANOWIRES; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TEMPERATURE; ZINC SULFIDE;

CRYSTALLINE SILICONS; INDIUM CATALYST; LOW TEMPERATURES; SITU GENERATION; WURTZITES;

SILICON COMPOUNDS;

EID: 55049118838 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/b813046a Document Type: Article

Times cited : (81)

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