Hysteresis and mode transitions in a low-frequency inductively coupled plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2185-2197

  Xu, S ^a,b   Ostrikov, K N ^a,b   Luo, W ^a   Lee, S ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b FLINDERS UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARRIER CONCENTRATION; CYCLOTRONS; ELECTROMAGNETIC FIELDS; ELECTRON TRANSITIONS; HYSTERESIS; IONS;

GAS PRESSURES; OPTICAL EMISSION SPECTRA;

MAGNETOPLASMA;

EID: 0034272634     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1286142     Document Type: Article

References (57)

1. J. Hopwood, Plasma Sources Sci. Technol. 1, 109 (1992);
2. J. H. Keller, Plasma Sources Sci. Technol. ibid. 5, 166 (1996);
3. Plasma Phys. Controlled Fusion 39, A437 (1997).
4. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).
5. F. F. Chen, Phys. Plasmas 2, 2164 (1995).
6. V. A. Godyak, R. B. Piejak, B. M. Alexandrovich, and V. I. Kolobov, Phys. Plasmas 6, 1804 (1999).
7. M. Tuszewski, Phys. Plasmas 5, 1198 (1998);
8. IEEE Trans. Plasma Sci. 27, 68 (1999).
9. I. M. El-Fayoumi, and I. R. Jones, Plasma Sources Sci. Technol. 7, 162 (1998);
10. I. M. El-Fayoumi, and I. R. Jones, Plasma Sources Sci. Technol. ibid. 7, 179 (1998).
11. Y. Wu and M. A. Lieberman, Appl. Phys. Lett. 72, 777 (1998).
12. U. Kortshagen, N. D. Gibson, and J. E. Lawler, J. Phys. D: Appl. Phys. 29, 1224 (1996).
13. I. M. El-Fayoumi, I. R. Jones, and M. M. Turner, Plasma Sources Sci. Technol. 7, 3082 (1998).
14. K. Suzuki, K. Nakamura, H. Ohkubo, and H. Sugai, Plasma Sources Sci. Technol. 7, 13 (1998).
15. G. Cunge, B. Crowley, D. Vender, and M. M. Turner, Plasma Sources Sci. Technol. 8, 576 (1999).
16. M. M. Turner and M. A. Lieberman, Plasma Sources Sci. Technol. 8, 313 (1999).
17. S. Xu, A. Shefiul, Y. Li, E. Tsakadze, and S. Lee, in Proceedings of the XI Gaseous Electronics Meeting, 31 January-2 February 2000, Armidale, NSW, Australia, Proceedings (UNE, Armidale, NSW, Australia, 2000), p. 10;
18. A. B. M. S. Azam, S. Xu, S. Lee, J. Ahn, O. J. Tien, X. F. Chen, and L. C. Lim, Sing. J. Phys. 14, 57 (1998).
19. S. Rauf and M. F. Kushner, J. Appl. Phys. 81, 5966 (1997).
20. J. Hopwood, C. R. Guarnieri, S. J. Whitehair, and J. J. Cuomo, J. Vac. Sci. Technol. A 11, 147 (1993);
21. J. E. Meyer, R. Mau, and A. E. Wendt, J. Appl. Phys. 79, 1298 (1996).
22. L. Stenflo and O. M. Gradov, Phys. Rev. E 58, 8044 (1998);
23. L. Stenflo, Radio Sci. 18, 1379 (1983).
24. K. N. Ostrikov, S. Xu, and S. Lee, in Proceedings of the XI Gaseous Electronics Meeting, 31 January-2 February 2000, Armidale, NSW, Australia, Proceedings (UNE, Armidale, NSW, Australia, 2000), p. 2.
25. V. Vahedi, M. A. Lieberman, G. DiPeso, T. D. Rognlien, and D. Hewett, J. Appl. Phys. 78, 1446 (1995).
26. J. D. Jackson, Classical Electrodynamics (Wiley, New York, 1967).
27. I. Ghanashev, M. Nagatsu, G. Xu, and H. Sugai, Jpn. J. Appl. Phys., Part 1 36, 4704 (1997).
28. I. Ghanashev, S. Morita, N. Toyoda, M. Nagatsu, and H. Sugai, Jpn. J. Appl. Phys., Part 1 38, 4313 (1999).
29. E. S. Aydil, J. A. Gregus, and R. A. Gottscho, J. Vac. Sci. Technol. A 11, 2883 (1993).
30. A. R. Ellingboe and R. W. Boswell, Phys. Plasmas 3, 2797 (1996).
31. J. P. Rayner and A. D. Cheetham, Plasma Sources Sci. Technol. 8, 91 (1999).
32. H. M. Gibbs, Optical Bistability: Controlling Light with Light (Academic, Orlando, FL, 1985);
33. Y. R. Shen, Principles of Nonlinear Optics (Wiley, New York, 1984).
34. F. F. Chen and R. W. Boswell, IEEE Trans. Plasma Sci. 25, 1245 (1997).
35. S. Ashida, C. Lee, and M. A. Lieberman, J. Vac. Sci. Technol. A 13, 2498 (1995).
36. M. M. Turner, Phys. Rev. Lett. 71, 1844 (1993).
37. K. P. Shamrai, V. P. Pavlenko, and V. B. Taranov, Plasma Phys. Controlled Fusion 39, 1754 (1997).
38. Yu. P. Raizer, Gas Discharge Physics (Springer, Berlin, 1991).
39. S. Brown, Basic Data of Plasma Physics (MIT, Cambridge, MA, 1966);
40. E. W. McDaniel, Collision Phenomena in Ionized Gases (Wiley, New York, 1964).
41. I. Langmuir and L. Tonks, Phys. Rev. 33, 1995 (1929).
42. P. A. Sa, J. Loureiro, and C. M. Ferreira, J. Phys. D: Appl. Phys. 25, 960 (1992).
43. A. Böhle and U. Kortshagen, Plasma Sources Sci. Technol. 3, 80 (1994).
44. K. Lee and D. E. Kim, Phys. Rev. E 60, 2224 (1999).
45. C. Yinhua, L. Wei, and W. Y. Yu, Phys. Rev. E 60, 3249 (1999).
46. K. N. Ostrikov, M. Y. Yu, and N. A. Azarenkov, J. Appl. Phys. 84, 4176 (1998);
47. K. N. Ostrikov, M. Y. Yu, and H. Sugai, J. Appl. Phys. ibid. 86, 2425 (1999).
48. rd.
49. A. V. Phelps, J. Chem. Ref. Data 20, 557 (1991).
50. K. N. Ostrikov, M. Y. Yu, S. V. Vladimirov, and O. Ishihara, Phys. Plasmas 6, 737 (1999);
51. S. V. Vladimirov, K. N. Ostrikov, and M. Y. Yu, Phys. Rev. E 60, 3257 (1999).
52. M. Moisan, C. Barbeau, R. Claude, C. M. Ferreira, J. Margot, J. Paraszczak, A. B. Sá, G. Suavé, and M. R. Wertheimer, J. Vac. Sci. Technol. B 9, 8 (1991).
53. V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, Phys. Rev. Lett. 80, 3264 (1998).
54. M. Tuszewski, J. T. Scheuer, and J. A. Tobin, J. Vac. Sci. Technol. A 13, 839 (1995).
55. T. Lagarde, J. Pelletier, and Y. Arnal, Plasma Sources Sci. Technol. 6, 53 (1997).
56. J. C. Helmer and J. Feinstein, J. Vac. Sci. Technol. B 12, 507 (1994).
57. G. DiPeso, T. D. Rognlien, V. Vahedi, and D. Hewett, IEEE Trans. Plasma Sci. 23, 550 (1995).