Effects of ion energy on the crystal size and hydrogen bonding in plasma-deposited nanocrystalline silicon thin films

Journal of Applied Physics

Volumn 97, Issue 10, 2005, Pages

  Lebib, S ^a   Roca i Cabarrocas, P ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL SIZE; CRYSTALITES; ION ENERGY; SPECTROSCOPIC ELLIPSOMETRY MEASUREMENTS;

AMORPHOUS MATERIALS; CRYSTAL STRUCTURE; DEPOSITION; ELECTRODES; ELLIPSOMETRY; HYDROGEN BONDS; INFRARED RADIATION; LIGHT ABSORPTION; NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

SILICON;

EID: 21044439713     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1913803     Document Type: Article

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