Optical emission spectroscopy investigation on very high frequency plasma and its glow discharge mechanism during the microcrystalline silicon deposition

Thin Solid Films

Volumn 472, Issue 1-2, 2005, Pages 125-129

  Yang, Huidong ^a,b   Wu, Chunya ^a   Huang, Junkai ^b   Ding, Ruiqin ^c   Zhao, Ying ^a   Geng, Xinhua ^a   Xiong, Shaozhen ^a  

^a NANKAI UNIVERSITY   (China)

^b JINAN UNIVERSITY   (China)

^c Wuyi University   (China)

Author keywords

Microcrystalline silicon film; Optical emission spectroscopy; VHF plasma

Indexed keywords

CRYSTALLINE MATERIALS; DEPOSITION; EMISSION SPECTROSCOPY; GLOW DISCHARGES; HIGH ENERGY ELECTRON DIFFRACTION; HYDROGENATION; MASS SPECTROMETRY; NANOSTRUCTURED MATERIALS; OPTIMIZATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SILICON; SILICON SOLAR CELLS;

OPTICAL EMISSION SPECTROSCOPY (OES); SOLAR SPECTRUM; VERY HIGH FREQUENCY (VHF) PLASMAS;

THIN FILMS;

EID: 10044241604     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.06.130     Document Type: Article

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