Optical proximity correction for a versatile LCD based direct write maskless photoplotter

Microelectronic Engineering

Volumn 86, Issue 12, 2009, Pages 2385-2391

  Kessels, M V ^a   Heggarty, K ^a  

^a TECHNOPÔLE BREST IROISE   (France)

Author keywords

Liquid crystals; Maskless patterning; Optical lithography; Spatial light modulator (SLM)

Indexed keywords

DIGITAL SIMULATION; DIRECT WRITE; DIRECT WRITING; GREY LEVELS; LIQUID CRYSTAL MICRODISPLAYS; MASK LESS; MASKLESS PATTERNING; OPTICAL LITHOGRAPHY; OPTICAL PROXIMITY CORRECTIONS; ORIGINAL STRUCTURES; PROXIMITY CORRECTION; RE-CONFIGURABLE; SPATIAL LIGHT MODULATOR (SLM); SPATIAL MODULATIONS;

COMPUTER SIMULATION; CRYSTALS; LIGHT MODULATION; LIQUID CRYSTALS; LIQUID MEMBRANE ELECTRODES; LIQUID MEMBRANES; PHOTOLITHOGRAPHY; PROJECTION SYSTEMS;

LIGHT MODULATORS;

EID: 70349772010     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.04.026     Document Type: Article

References (22)

1. Fu C.C., Yang T., and Stone D.R. IEEE Trans. on Electron Devices 38 12 (1991) 2599
2. Ronse K. C.R. Physique 7 8 (2006) 844
3. Schellenberg F.M. IEEE Spectrum 40 (2003) 34
4. Zhang H., Morrow J., and Schellenberg F.M. Microelectron. Eng. 41-42 (1998) 79
5. Amoroso F., Cote M., Do T., et al. Proc. SPIE 5992 (2005) 670
6. Y.-R. Wu, M.-C. Tsai, T.-C. Wang, in: Asia and South Pacific Design Automation Conference, vol. 1, 2005, p. 198.
7. T. Terasawa, in: Asia and South Pacific Design Automation Conference, 2000, p. 295.
8. Gil D., Menon R., Tang X., et al. J. Vac. Sci. Technol. B 20 6 (2002) 2597
9. Seltmann R., Doleschal W., Gehner A., et al. Microelectron. Eng. 30 1-4 (1996) 123
10. Paufler J., Brunn S., Körner T., et al. Microelectron. Eng. 57-58 (2001) 31
11. Chan K.F., Feng Z., Yang R., et al. Microlithogr. Microfabr. Microsyst. 2 4 (2003) 331
12. Gao Y., Sheng T., Chen J., et al. Optik (Jena) 116 7 (2005) 303
13. Martinsson H., Sandstrom T., Bleeker A., et al. Microlithogr. Microfabr. Microsyst. 4 1 (2005) 11003
14. Kessels M.V., El Bouz M., Pagan R., et al. Microlithogr. Microfabr. Microsyst. 6 3 (2007) 033002
15. Ekberg M., Nikolajeff F., Larsson M., et al. Appl. Opt. 33 1 (1994) 103
16. Grella L., Di Fabrizio E., Gentili M., et al. Microelectron. Eng. 35 (1997) 495
17. Du J., Huang Q., Su J., et al. Microelectron. Eng. 46 1-4 (1999) 73
18. Cui Z., Du J., Huang Q., et al. Microelectron. Eng. 53 1-4 (2000) 153
19. Dumbravescu N. Mater. Sci. Semicond. Process. 3 (2000) 569
20. Yu H., Li B., and Zhang X. Sensors Actuators A 125 (2006) 553
21. Yamazaki K., Yamaguchi T., and Namatsu H. Jpn. J. Appl. Phys. 43 8B (2004) 1111
22. Osipowicz T., van Kan J.A., Sum T.C., et al. Nucl. Instr. Meth. Phys. Res. B 161-163 (2000) 83