Experiments for 3-D structuring of thick resists by gray tone lithography

Materials Science in Semiconductor Processing

Volumn 3, Issue 5-6, 2000, Pages 569-573

  Dumbravescu, N ^a  

^a NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; LASER APPLICATIONS; LIGHT MODULATION; MASKS; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

BINARY MULTI-MASKING METHODS; GRAY-TONE LITHOGRAPHY; LASER MICRO-STEREOLITHOGRAPHY;

PHOTORESISTS;

EID: 0034290875     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(00)00086-X     Document Type: Article

References (6)

1. Henke W, Hope W, Quenzer HJ, Staudt-Fischbach P, Wagner B. Simulation and experimental study of gray-tone lithography for the fabrication of arbitrarily shaped surfaces. Proc. IEEE Micro Electro Mechanical System, 1994. p. 205-10.
2. Daschner W, Long P, Stein R. General aspheric refractive Micro-optics fabricated by optical lithography using a high-energy-beam-sensitive glass gray-level mask. J Vac Sci Technol B 1996;14(6).
3. Su J, Du J, Yao J, Gao F, Guo Y, Cui Z. A new method to design half-tone mask for the fabrication of continuous micro relief structure, DTM of MEMs and MOEMs. Proc SPIE 1999;3680:879-86.
4. Dumbravescu N, Hie M, Divan R. 3-D structuring of thick resists by gray-tone lithography. Poster at IMT's day, 1998.
5. Nicolas S, et al. 3-D, deep X-ray, gray-tone lithography. Micromechanics Europe '98.
6. Shvartsman FP. Replication of diffractive optics. Crit Rev CR 1994;49:165-86.