Current status of optical maskless lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 4, Issue 1, 2005, Pages 1-15

  Martinsson, Hans ^a   Sandstrom, Tor ^a   Bleeker, Arno ^b   Hintersteiner, Jason D ^c  

^a Micronic Laser Systems AB   (Sweden)

^b ASML   (Netherlands)

^c ASML US Inc   (United States)

Author keywords

Chromeless phase lithography; Maskless lithography; Microlithography; Micromirrors; Phase shifting; Piston mirrors; Resolution enhancement; Spatial light modulators; Tilting mirrors

Indexed keywords

CHROMELESS PHASE LITHOGRAPHY; MASKLESS LITHOGRAPHY; MICROMIRRORS; PHASE SHIFTING; PISTON MIRRORS; RESOLUTION ENHANCEMENT; TILTING MIRRORS;

ALGORITHMS; COSTS; LIGHT MODULATION; MASKS; MATHEMATICAL MODELS; MIRRORS; PHASE SHIFT; SCANNING;

PHOTOLITHOGRAPHY;

EID: 24144467089     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1862649     Document Type: Article

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