Optical proximity correction: A detail comparison of techniques and their effectiveness

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 79-82

  Zhang, H ^a,b   Morrow, J ^a,c   Schellenberg, F M ^a,d  

^a SEMATECH   (United States)

^b Rockwell Semiconductor Systems   (United States)

^c MOTOROLA INC   (United States)

^d KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SOFTWARE; MASKS; OPTICS; SEMICONDUCTOR DEVICE MANUFACTURE;

OPTICAL PROXIMITY CORRECTION;

LITHOGRAPHY;

EID: 12844254634     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00017-3     Document Type: Article

References (1)

1. F.M. Schellenberg, H. Zhang, J. Morrow, "Evaluation of ope efficacy", Optical Microlithography IX, Proc. SPIE Vol. 2726, pp. 680-688.