Proximity correction for e-beam patterned sub-500nm diffractive optical elements

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 495-498

  Grella, L ^a   Di Fabrizio, E ^a   Gentili, M ^a   Baciocchi, M ^a   Maggiora, R ^a  

^a Ist Elettron dello Stato S   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; DIFFRACTION GRATINGS; MEASUREMENTS; OPTICAL DEVICES; THREE DIMENSIONAL;

DIFFRACTIVE OPTICAL ELEMENT; OPTICAL GRATINGS; PROXIMITY CORRECTION ALGORITHM;

ELECTRON BEAM LITHOGRAPHY;

EID: 0031071841     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00194-3     Document Type: Article

References (6)

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3. M. Parikh, IBM J. Res. Dev. 24(4), 438, (1980)
4. E. Di Fabrizio, L. Grella, M. Baciocchi, M. Gentili, D. Peschiaroli, L. Mastrogiacomo, R. Maggiora, Jpn. J. Appl. Phys. Vol. 35, 2855, May 1996.
5. E. Di Fabrizio, M. Gentili, L. Grella, M. Baciocchi, A. Krasnoperova, F. Cerrina, W. Yun, B. Lai, E. Gluskin, J. Vac. Sci. Technol. B 12(6), Nov/Dec 1994
6. M. Duparre, M. A. Golub, B. Ludge, V.S. Pavelyev, V.A. Soifer, G.V. Uspleniev, S.G. Volotovskii, Appl. Optics 34, No. 14, 2489, 1995.