Parallel maskless optical lithography for prototyping, low-volume production, and research

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2597-2601

  Gil, Darig ^a   Menon, Rajesh ^a   Tang, Xudong ^a   Smith, Henry I ^a   Carter, D J D ^b  

^a Massachusetts Institute of Technol ^*  (United States)

^b CHARLES STARK DRAPER LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; MICROELECTROMECHANICAL DEVICES; MICROSCOPIC EXAMINATION; PHOTOMECHANICS; SEMICONDUCTING SILICON;

FRESNEL ZONE PLATES; MASKLESS LITHOGRAPHY; MULTIPLE BEAMS; ZONE PLATE ARRAY MICROSCOPY;

PHOTOLITHOGRAPHY;

EID: 0036883127     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1526353     Document Type: Article

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