Parallel maskless optical lithography for prototyping, low-volume production, and research

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2597-2601

  Gil, Darig ^a   Menon, Rajesh ^a   Tang, Xudong ^a   Smith, Henry I ^a   Carter, D J D ^b  

^a USA   (United States)

^b CHARLES STARK DRAPER LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; MICROELECTROMECHANICAL DEVICES; MICROSCOPIC EXAMINATION; PHOTOMECHANICS; SEMICONDUCTING SILICON;

FRESNEL ZONE PLATES; MASKLESS LITHOGRAPHY; MULTIPLE BEAMS; ZONE PLATE ARRAY MICROSCOPY;

PHOTOLITHOGRAPHY;

EID: 0036883127     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1526353     Document Type: Article

References (10)

1. M. J. Bass and C. M. Christensen, IEEE Spectrum 39, 34 (2002).
2. J. Ferrera, V. V. Wong, S. Rishton, V. Boegli, E. H. Anderson, D. P. Kern, and H. I. Smith, J. Vac. Sci. Technol. B 11, 2342 (1993).
3. J. G. Goodberlet, J. Ferrera, and H. I. Smith, J. Vac. Sci. Technol. B 15, 2293 (1997).
4. J. T. Hastings, M. H. Lim, J. G. Goodberlet, and H. I. Smith, J. Vac. Sci. Technol. B (to be published).
5. B. J. Grenon, H. C. Hamaker, and P. D. Buck, Microelectron. Eng. 27, 225 (1995).
6. H. I. Smith, J. Vac. Sci. Technol. B 14, 4318 (1996).
7. D. J. D. Carter, D. Gil, R. Menon, M. K. Mondol, H. I. Smith, and E. H. Anderson, J. Vac. Sci. Technol. B 17, 3449 (1999).
8. D. Gil, R. Menon, D. J. D. Carter, and H. I. Smith. J. Vac. Sci. Technol. B 18, 2881 (2000).
9. R. B. Doak, R. E. Grisenti, S. Rehbein, G. Schmahl, J. P. Toennies, and C. Woll, Phys. Rev. Lett. 83, 4229 (1999).
10. White papers on Silicon Light Machines GLV technology: http://www.siliconlight.com/htmlpgs/glvtechframes/glvmainframeset.html