Maze routing with OPC consideration

Proceedings of the Asia and South Pacific Design Automation Conference, ASP-DAC

Volumn 1, Issue , 2005, Pages 198-203

  Wu, Yun Ru ^a   Tsai, Ming Chao ^a   Wang, Ting Chi ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOLITHOGRAPHY;

DIFFRACTION EFFECTS; MANUFACTURING PROCESS; MAZE ROUTING; NANOMETER DESIGN; OPTICAL EFFECTS; OPTICAL PROXIMITY CORRECTIONS; OPTIMAL ALGORITHM; PROCESS VARIATION;

COMPUTER AIDED DESIGN;

EID: 84861430891     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/1120725.1120804     Document Type: Conference Paper

References (6)

1. P. Gupta and A. B. Kahng, "Manufacturing-Aware Physical Design," Proc. International Conference on Computer Aided Design, 2003, pp. 681-687.
2. W. Grobman, M. Thompson, R. Wang, C. Yuan, R. Tian and E. Demircan, "Reticle Enhancement Technology: Implication and Challenges for Physical Design," Proc. Design Automation Conference, 2001, pp. 73-78.
3. L.-D. Huang and D. F. Wong, "Optical Proximity Correction (OPC)-Friendly Maze Routing," Proc. Design Automation Conference, 2004, pp. 186-191.
4. C. Y. Lee, "An Algorithm for Path Connection and Its Application," IRE Trans. Electronic Computer, EC-10, 1961.
5. J. D. Plummer, M. D. Deal and P. B. Griffin, Silicon VLSI Technology, Prentice Hall, 2000.
6. L. K. Scheffer, "Physical CAD Changes to Incorporate Design for Lithography and Manufacturability," Proc. Asia and South Pacific Design Automation Conference, 2004, pp. 766-771.