Embedded tutorial: Subwavelength lithography

Proceedings of the Asia and South Pacific Design Automation Conference, ASP-DAC

Volumn , Issue , 2000, Pages 295-300

  Terasawa, Tsuneo ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPTH OF FOCUS; IMAGING CHARACTERISTICS; OPTICAL PROXIMITY EFFECT CORRECTIONS; PATTERN DESIGNS; PHASE-SHIFT MASK; RESOLUTION ENHANCEMENT TECHNIQUE; SUB-WAVELENGTH; SUBWAVELENGTH LITHOGRAPHY;

COMPUTER AIDED DESIGN; PHOTOMASKS;

LITHOGRAPHY;

EID: 84884681039     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/368434.368638     Document Type: Conference Paper

References (16)

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