Continuous Image Writer with improved critical dimension performance for high-accuracy maskless optical patterning

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 31-40

  Paufler, J ^a   Brunn, St ^a   Korner T ^a   Kuhling F ^a  

^a SENTECH INSTRUMENTS GMBH   (Germany)

Author keywords

Continuous image writer (CIW); DUV; Maskless patterning; Optical lithography; Photomasks; Spatial light modulator (SLM)

Indexed keywords

EXCIMER LASERS; FOURIER OPTICS; IMAGE ANALYSIS; LASER PULSES; LIGHT MODULATORS; PATTERN RECOGNITION; PHOTOLITHOGRAPHY; PHOTORESISTS; SUBSTRATES;

CONTINUOUS IMAGE WRITER (CIW); MASKLESS PATTERNING;

MASKS;

EID: 0035450388     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00427-0     Document Type: Conference Paper

References (6)

1. Continuous image writer - A new approach to fast direct writing, optical microlithography XIII
2. Construction of microcolumn system and its application to nanolithography
3. A high throughput electron-beam direct-write lithography system
4. New system for fast submicron laser direct writing, optical/laser microlithography VIII
5. Improved critical dimension control in 0.8-NA laser writers 19th annual BACUS symposium on photomask technology
6. New architecture for laser pattern generators for 130 nanometers and beyond, 20th annual BACUS symposium on photomask technology