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Volumn 97, Issue 1, 2009, Pages 45-54
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Development of polycrystalline silicon films on flexible metallic substrates by aluminium induced crystallization
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Author keywords
[No Author keywords available]
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Indexed keywords
A-THERMAL;
ALUMINIUM-INDUCED CRYSTALLIZATION;
AMORPHOUS PHASE;
AMORPHOUS SILICON FILM;
ANNEALING TEMPERATURES;
AS-GROWN;
BARRIER LAYERS;
ECR-PECVD;
FOREIGN SUBSTRATES;
HIGH QUALITY;
HIGHER ORDER;
LOW COSTS;
METALLIC FOILS;
METALLIC SUBSTRATE;
PHOTOVOLTAIC ELECTRICITIES;
POLY-CRYSTALLINE SILICON;
POLYCRYSTALLINE SILICON FILMS;
REFLECTANCE SPECTROSCOPY;
SI FILMS;
SI LAYER;
STRESS LEVELS;
SUPPORTING MATERIAL;
THIN-FILM SILICON SOLAR CELLS;
ALUMINUM;
AMORPHOUS FILMS;
AMORPHOUS SILICON;
CRYSTALLIZATION;
METALLIC FILMS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYCRYSTALLINE MATERIALS;
POLYSILICON;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON SOLAR CELLS;
SOLAR POWER GENERATION;
SPECTROSCOPY;
THERMAL EXPANSION;
SUBSTRATES;
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EID: 69549126025
PISSN: 09478396
EISSN: 14320630
Source Type: Journal
DOI: 10.1007/s00339-009-5331-y Document Type: Article |
Times cited : (4)
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References (39)
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