메뉴 건너뛰기




Volumn 97, Issue 1, 2009, Pages 45-54

Development of polycrystalline silicon films on flexible metallic substrates by aluminium induced crystallization

Author keywords

[No Author keywords available]

Indexed keywords

A-THERMAL; ALUMINIUM-INDUCED CRYSTALLIZATION; AMORPHOUS PHASE; AMORPHOUS SILICON FILM; ANNEALING TEMPERATURES; AS-GROWN; BARRIER LAYERS; ECR-PECVD; FOREIGN SUBSTRATES; HIGH QUALITY; HIGHER ORDER; LOW COSTS; METALLIC FOILS; METALLIC SUBSTRATE; PHOTOVOLTAIC ELECTRICITIES; POLY-CRYSTALLINE SILICON; POLYCRYSTALLINE SILICON FILMS; REFLECTANCE SPECTROSCOPY; SI FILMS; SI LAYER; STRESS LEVELS; SUPPORTING MATERIAL; THIN-FILM SILICON SOLAR CELLS;

EID: 69549126025     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-009-5331-y     Document Type: Article
Times cited : (4)

References (39)
  • 20
    • 0003772956 scopus 로고
    • Springer Berlin
    • G. Harbeke, Polycrystalline Semiconductors. Springer Series in Solid-State Science, vol. 57 (Springer, Berlin, 1985), p. 156
    • (1985) , vol.57 , pp. 156
    • Harbeke, G.1
  • 25
    • 69549131323 scopus 로고
    • Academic Press Orlando
    • E.D. Palik, Handbook of Optical Constants of Solids (Academic Press, Orlando, 1985), pp. 547-569
    • (1985) , pp. 547-569
    • Palik, E.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.