Micro-scale characterization of crystalline phase and stress in laser-crystallized poly-Si thin films by Raman spectroscopy

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 38, Issue 11 B, 1999, Pages

  Kitahara, Kuninori ^a   Moritani, Akihiro ^a   Hara, Akito ^b   Okabe, Masahiro ^b  

^a SHIMANE UNIVERSITY   (Japan)

^b FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; GRAIN BOUNDARIES; LASER BEAM EFFECTS; LIQUID CRYSTAL DISPLAYS; RAMAN SPECTROSCOPY; SEMICONDUCTING FILMS; STRESS RELAXATION; TENSILE STRESS; THIN FILMS;

LASER CRYSTALLIZATION; MICROCRYSTALS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0033324222     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.l1312     Document Type: Article

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