Study of low-temperature crystallization of amorphous Si films obtained using ferritin with Ni nanoparticles

Applied Physics Letters

Volumn 86, Issue 26, 2005, Pages 1-3

  Kirimura, Hiroya ^a   Uraoka, Yukiharu ^a   Fuyuki, Takashi ^a   Okuda, Mitsuhiro ^b   Yamashita, Ichiro ^b  

^a NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^b PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS MATERIALS; CARRIER CONCENTRATION; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTALLIZATION; GRAIN SIZE AND SHAPE; LOW TEMPERATURE EFFECTS; NANOSTRUCTURED MATERIALS; NICKEL; POLYCRYSTALLINE MATERIALS; SILICON; THIN FILM TRANSISTORS;

FERRITIN; METAL SILICIDATION PHENOMENA; METAL-INDUCED CRYSTALLIZATION (MIC) METHODS; POLYCRYSTALLINE SILICON FILMS;

THIN FILMS;

EID: 22144469823     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1954872     Document Type: Article

References (20)

1. H. J. Kim, J. S. Im, and M. O. Thompson, Mater. Res. Soc. Symp. Proc. 283, 703 (1993).
2. R. C. Cammarata, C. V. Thomson, C. Hayzelden, and K. N. Tu, J. Mater. Res. 5, 2133 (1990).
3. C. Hayzelden and J. L. Batstone, J. Appl. Phys. 73, 8279 (1993).
4. J. Jang, J. Y. Oh, S. K. Kim, Y. J. Choi, S. Y. Yoon, and C. O. Kim, Nature (London) 395, 481 (1998).
5. S. Jagar, M. Chan, H. Wang, V. M. C. Poon, and A. M. Myansnikov, Solid-State Electron. 45, 743 (2001).
6. S. Y. Yoon, S. J. Park, K. H. Kim, J. Jang, and C. O. Kim, J. Appl. Phys. 87, 609 (2000).
7. J. Jang, S. J. Park, K. H. Kim, B. R. Cho, W. K. Kwak, and S. Y. Yoon, J. Appl. Phys. 88, 3099 (2000).
8. J. H. Choi, D. Y. Kim, B. K. Choo, W. S. Sohn, and J. Jang, Electrochem. Solid-State Lett. 6, G16 (2003).
9. W. S. Sohn, J. H. Choi, K. H. Kim, J. H. Oh, S. S. Kim, and J. Jang, J. Appl. Phys. 94, 4326 (2003).
10. J. H. Choi, S. S Kim, J. H. Cheon, S. J. Park, Y. D. Son, and J. Jangz, J. Electrochem. Soc. 151, G448 (2004).
11. K. Makihara and T. Asano, Appl. Phys. Lett. 76, 3774 (2000).
12. I. Yamashita, Thin Solid Films 393, 12 (2001).
13. M. Okuda, K. Iwahori, I. Yamashita, and H. Yoshimura, Biotechnol. Bioeng. 84, 188 (2003).
14. T. Hikono, Y. Uraoka, T. Fuyuki, and I. Yamashita, Jpn. J. Appl. Phys., Part 2 42, L398 (2003).
15. C. Hayzelden and J. L. Batstone, J. Appl. Phys. 73, 8279 (1993).
16. K. N. Tu and J. W. Mayer, in Thin Films-Interdiffusion and Reactions, edited by, J. M. Poate, K. N. Tu, and, J. W. Mayer, (Wiley, NewYork, 1978), p. 359.
17. Y. Kawazu, H. Kudo, S. Onari, and T. Arai, Jpn. J. Appl. Phys., Part 1 29, 2698 (1990).
18. K. N. Tu, G. Ottaviani, U. Gosele, and H. Foll, J. Appl. Phys. 54, 758 (1983).
19. G. L. Olson and J. A. Roth, Mater. Sci. Eng., R. 3, 1 (1988).
20. C. S. Pai, S. S. Lau, and I. Suni, in Layered Structures and Interface Kinetics, edited by, S. Furukawa, (KTK Scientific Publishers, Tokyo D. Reidel Publishers, Boston, 1985), p. 133.