Large-grained polycrystalline silicon on glass for thin-film solar cells

Thin Solid Films

Volumn 511-512, Issue , 2006, Pages 7-14

  Gall, S ^a   Schneider, J ^a   Klein, J ^a   Hubener K ^a   Muske, M ^a   Rau, B ^a   Conrad, E ^a   Sieber, I ^a   Petter, K ^a   Lips, K ^a   Stoger Pollach M ^b   Schattschneider, P ^b   Fuhs, W ^a  

^a HAHN MEITNER INSTITUT   (Germany)

^b VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Aluminium; Chemical vapor deposition (CVD); Crystallization; Epitaxy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; ELECTRON CYCLOTRON RESONANCE; EPITAXIAL GROWTH; GLASS; POLYSILICON; THIN FILM DEVICES;

DEFECT PASSIVATION; EPITAXIAL THICKENING; OPEN CIRCUIT VOLTAGE; SOLAR CELL STRUCTURES;

SILICON SOLAR CELLS;

EID: 33747438816     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.067     Document Type: Article

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