Structural and optical properties of ZnO films on Si substrates using a γ-Al2O3 buffer layer

Journal of Physics D: Applied Physics

Volumn 39, Issue 2, 2006, Pages 269-273

  Shen, W J ^a   Wang, J ^a   Wang, Q Y ^a   Duan, Y ^a   Zeng, Y P ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; GAMMA RAYS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; RAMAN SPECTROSCOPY; RESIDUAL STRESSES; SILICON; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

PHOTOLUMINESCENCE (PL) SPECTROSCOPY; SPECTRAL PROPERTIES; ZNO FILMS;

ZINC OXIDE;

EID: 32644483546     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/39/2/006     Document Type: Article

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