Nanocrystalline Si formation in the a-Si/Al system on polyimide and silicon dioxide substrates

Thin Solid Films

Volumn 516, Issue 12, 2008, Pages 3940-3947

  Alford, T L ^a   Shetty, P K ^a   Theodore, N D ^b   Tile, N ^c   Adams, D ^c   Mayer, J W ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

^b FREESCALE SEMICONDUCTOR INC   (United States)

^c UNIVERSITY OF THE WESTERN CAPE   (South Africa)

Author keywords

Aluminum induced crystallization; Polyimide; XTEM

Indexed keywords

AMORPHOUS SILICON; POLYIMIDES; POLYSILICON; SILICA;

ALUMINUM INDUCED CRYSTALLIZATION; THERMAL ANNEALING;

NANOCRYSTALLINE MATERIALS;

EID: 40749158615     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.07.204     Document Type: Article

References (47)

1. Son M.-S., Yoo K.-H., and Jang J. Solid-State Electron. 48 (2004) 2307
2. Wagner S., Gleskova H., Cheng I.-C., and Wu M. Thin Solid Films 430 (2003) 15
3. Wu M., and Wagner S. Appl. Surf. Sci. 175 (2001) 753
4. Brotherton S.D., Ayres J.R., Edwards M.J., Fisher C.A., Glaister C., Gowers J.P., McCulloch D.J., and Trainor M. Thin Solid Films 337 (1999) 188
5. Brotherton S.D., Ayres J.R., and Young N.D. Solid-State Electron. 34 (1991) 671
6. Ditizio R.A., Liu G., Fonash S.J., Hseih B.-C., and Greve D.W. Appl. Phys. Lett. 56 (1990) 1140
7. Becker F.S., Oppolzer H., Weitzel I., Eichermüller H., and Schaber H. J. Appl. Phys. 56 (1984) 1233
8. Hatalis M.K., and Greve D.W. J. Appl. Phys. 63 (1988) 2260
9. Nakamura A., Emoto F., Fujii E., Uemoto Y., Yamamoto A., Senda K., and Kano G. J. Appl. Phys. (1989) 4248
10. Girginoudi S., Girginoudi D., Thanailakis A., Georgoulas N., and Papaioannou V. J. Appl. Phys. 84 (1998) 1968
11. Haji L., Joubert P., Stoemenos J., and Economou N.A. J. Appl. Phys. 75 (1994) 3944
12. Fogarassy E., de Unamuno S., Prevot B., Boher P., Stehle M., and Pribat D. Appl. Phys. 68 (1999) 631
13. Zhang F., Liu X., Ni G., and Du Y. J. Cryst. Growth 260 (2004) 102
14. Mariucci L., Pecora A., Fortunato G., Spinella C., and Bongiorno C. Thin Solid Films 427 (2003) 91
15. Ishihara R., van der Wilt P.C., van Dijk B.D., Burtsev A., Metselaar J.W., and Beenakker C.I.M. Thin Solid Films 427 (2003) 77
16. Yoon S.Y., Park S.J., Kim K.H., and Jang J. Thin Solid Films 383 (2001) 34
17. Yoon S.Y., Oh J.Y., Kim C.O., and Jang J. Solid State Commun. 106 (1998) 325
18. Wang Y.Z., and Awadelkarim O.O. Appl. Phys., A 70 (2000) 587
19. Quli F.A., and Singh J. Mater. Sci. Eng., B, Solid-State Mater. Adv. Technol. 67 (1999) 139
20. Choi J.H., Kim D.Y., Kim S.S., Park S.J., and Jang J. Thin Solid Films 440 (2003) 1
21. Izmajlowicz M.A.T., Flewitt A.J., Milne W.I., and Morrison N.A. J. Appl. Phys. 94 (2003) 7535
22. Pihan E., Slaoui A., Roca P., Cabarrocas I., and Focsa A. Thin Solid Films 451 (2004) 328
23. Dimova-Malinovska D., Angelov O., Sendova-Vassileva M., Kamenova M., and Pivin J.-C. Thin Solid Films 451 (2004) 303
24. Nast O., and Wenham S.R. J. Appl. Phys. 88 (2000) 124
25. Konno T.J., and Sinclair R. Mater. Sci. Eng., A Struct. Mater.: Prop. Microstruct. Process. 179 (1994) 426
26. Yoon S.Y., Kim K.H., Kim C.O., Oh J.Y., and Jang J. J. Appl. Phys. 82 (1997) 5865
27. Pereira L., Águas H., Martins R.M.S., Vilarinho P., Fortunato E., and Martins R. Thin Solid Films 451 (2004) 334
28. Borchardt J.K. Mater. Today 7 (2004) 42
29. MacDonald W.A. J. Mater. Chem. 14 (2004) 4
30. Shahrjerdi D., Hekmatshoar B., Rezaee L., and Mohajerzadeh S.S. Thin Solid Films 27 (2003) 330
31. Hekmatshoar B., Shahrjerdi D., Mohajerzadeh S., Khakifirooz A., Robertson M., Tonita A., and Bennett J.C. J. Vac. Sci. Technol., A, Vac. Surf. Films 22 (2004) 856
32. Doolittle R. Nucl. Instrum. Methods Phys. Res., B Beam Interact. Mater. Atoms 9 (1985) 344
33. Shetty P.K., Theodore N.D., Ren J., Menendez J., Kim H.C., Misra E., Mayer J.W., and Alford T.L. Mater. Lett. 59 (2005) 872
34. Widenborg P.I., and Aberle A.G. J. Cryst. Growth 242 (2002) 270
35. Hiraki A. Surf. Sci. 168 (1986) 74
36. Radnoczi G., Hasan M.-A., and Sundgren J.-E. Thin Solid Films 240 (1994) 39
37. Dirks A.G., and Leamy H.J. Thin Solid Films 47 (1977) 219
38. Porter D.A., and Easterling K.E. Phase Transformations in Metals and Alloys (1992), Chapman and Hall, London 99
39. Jaccodin R.J. J. Electrochem. Soc. 110 (1963) 524
40. Blum N.A., and Feldman C. J. Non-Cryst. Solids 11 (1972) 242
41. J.W. Mayer, S.S. Lau, In: Electronic Materials Science: For Integrated Circuits in Si and GaAs, Macmillan Publishing Company, New York, 1990, p. 186-189, p. 281, p. 1547.
42. Caro A., Drabold D.A., and Sankey O.F. Phys. Rev., B 49 (1994) 6647
43. Donovan E.P., Spaepen F., Turnbull D., Poate J.M., and Jacobson D.C. J. Appl. Phys. 57 (1985) 1795
44. Štich I., Car R., and Parrinello M. Phys. Rev., B 44 (1991) 11092
45. Roorda S., Sinke W.C., Poate J.M., Jacobson D.C., Dierker S., Dennis B.S., Eaglesham D.J., Spaepen F., and Fuoss P. Phys. Rev., B 44 (1991) 3702
46. Nakamura K., Nicolet M.-A., Mayer J.W., Blattner R.J., and Evans Jr. C.A. J. Appl. Phys. 46 (1975) 4678
47. Tong Q.-Y., Schmidt E., Gösele U., and Reiche M. Appl. Phys. Lett. 64 (1994) 625