Development of a titanium plasma etch process for uncooled titanium nanobolometer fabrication

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 971-975

  Gilmartin, Stephen F ^a   Arshak, Khalil ^a   Bain, Dave ^b   Lane, William A ^b   Collins, Damian ^c   Arshak, Arousian ^a   McCarthy, Brendan ^a   Newcomb, Simon B ^d   Walsh, Michelle ^c  

^a UNIVERSITY OF LIMERICK   (Ireland)

^b ANALOG DEVICES   (Ireland)

^c Boston Scientific   (Ireland)

^d Glebe Laboratories   (Ireland)

Author keywords

Bolometer; EBL; MEMS; Nanobolometer; Plasma etch; Titanium

Indexed keywords

EBL; ETCH PROCESS; FRACTIONAL FACTORIAL EXPERIMENTS; INFRARED SENSORS; IR SENSORS; MAIN EFFECTS; METAL PLASMAS; NANO-SCALE; NANOBOLOMETER; NANOSCALE ETCH; PLASMA ETCH; PROCESS PARAMETERS; TARGET LEVELS; TITANIUM PLASMAS; UNCOOLED;

BOLOMETERS; INFRARED DETECTORS; MEMS; MICROELECTROMECHANICAL DEVICES; NANOSENSORS; NANOSTRUCTURED MATERIALS; SENSORS; TITANIUM;

PLASMAS;

EID: 67349139189     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.02.009     Document Type: Article

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