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Journal of Materials Science: Materials in Electronics
Volumn 13, Issue 4, 2002, Pages 187-191
Etch characteristics of Pt by using BCl3/Cl2-gas mixtures
(4)
Kwon, Kwang Ho
a
Kang, Seung Youl
b
Kim, Sung Ihl
c
Hong, Nam Kwan
a
a
Hanseo University
(
South Korea
)
b
Electronics and Telecommunications Research Institute (ETRI)
(
South Korea
)
c
Daejeon University
(
South Korea
)
Author keywords
[No Author keywords available]
Indexed keywords
BORON COMPOUNDS; CHLORINE; CURRENT DENSITY; EMISSION SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA; MIXTURES; PLASMA ETCHING; VAPORIZATION; X RAY PHOTOELECTRON SPECTROSCOPY;
GAS MIXTURES; OPTICAL EMISSION SPECTROSCOPY;
PLATINUM;
EID
:
0036539541
PISSN
:
09574522
EISSN
:
None
Source Type
:
Journal
DOI
:
10.1023/A:1014872314719
Document Type
:
Article
Times cited : (
6
)
References (
22
)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.
