Low-cost 320×240 uncooled IRFPA using conventional silicon IC process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3698, Issue , 1999, Pages 556-564

  Ishikawa, Tomohiro ^a   Ueno, Masashi ^a   Endo, Kazuyo ^a   Nakaki, Yoshiyuki ^a   Hata, Hisatoshi ^a   Sone, Takanori ^a   Kimata, Masafumi ^a   Ozeki, Tatsuo ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MICROMACHINING; SEMICONDUCTOR DIODES; SEMICONDUCTOR JUNCTIONS; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS;

INFRARED FOCAL PLANE ARRAYS (IRFPA);

INFRARED DETECTORS;

EID: 0032689075     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (7)