Uncooled IR nanobolometers fabricated by electron beam lithography and a MEMS/CMOS process

2008 8th IEEE Conference on Nanotechnology, IEEE-NANO

Volumn , Issue , 2008, Pages 131-134

  Gilmartin, S F ^a   Arshak, K ^b   Collins, D ^a   Bain, D ^a   Lane, W A ^a   Korostynska, O ^b   Arshak, A ^b   Hynes, E ^c   McCarthy, B ^d   Newcomb, S B ^e  

^a ANALOG DEVICES   (Ireland)

^b UNIVERSITY OF LIMERICK   (Ireland)

^c Advanced Manufacturing Control Systems Ltd   (Ireland)

^d UNIVERSITY COLLEGE CORK   (Ireland)

^e NEWPORT CORPORATION   (United States)

Author keywords

CMOS; IR; MEMS; Nanobolometer; TCR

Indexed keywords

EID: 55449096889     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NANO.2008.46     Document Type: Conference Paper

References (23)

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