Low temperature fabrication of VOx thin films for uncooled IR detectors by direct current reactive magnetron sputtering method

Infrared Physics and Technology

Volumn 51, Issue 4, 2008, Pages 287-291

  Dai, Jun ^a,b   Wang, Xingzhi ^a   He, Shaowei ^a,b   Huang, Ying ^a   Yi, Xinjian ^a,b  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Low temperature; Magnetron sputtering; Uncooled bolometric detectors; Vanadium oxide films

Indexed keywords

DETECTORS; INFRARED RADIATION; LOW TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; VANADIUM COMPOUNDS;

UNCOOLED BOLOMETRIC DETECTORS; VANADIUM OXIDE FILMS;

THIN FILMS;

EID: 39849096411     PISSN: 13504495     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.infrared.2007.12.002     Document Type: Article

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