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Volumn 79, Issue 16, 2009, Pages

Structure and diffusion of boron in amorphous silica: Role of oxygen vacancy related defects

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Indexed keywords


EID: 65149102692     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.79.165201     Document Type: Article
Times cited : (6)

References (31)
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    • Diffusivity measurements of silicon in silicon dioxide layers using isotopically pure material
    • DOI 10.1063/1.1371003
    • D. Tsoukalas, C. Tsamis, and P. Normand, J. Appl. Phys. 89, 7809 (2001). 10.1063/1.1371003 (Pubitemid 33662831)
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    • Tsoukalas, D.1    Tsamis, C.2    Normand, P.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.