Mechanisms of diffusion of boron impurities in SiO2

Physical Review Letters

Volumn 90, Issue 7, 2003, Pages

  Otani, Minoru ^a   Shiraishi, Kenji ^a   Oshiyama, Atsushi ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ATOMIC PHYSICS; BORON; CALCULATIONS; CHEMICAL BONDS; DIFFUSION; IMPURITIES; REACTION KINETICS;

ATOMIC REARRANGEMENTS; BONDING FEASIBILITY; BORON DIFFUSION; RECOMBINATION ENHANCED DIFFUSION;

SILICA;

EID: 0037458408     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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