Silicon self-diffusivity measurement in thermal SiO2 by 30Si/28Si isotopic exchange

Journal of Applied Physics

Volumn 94, Issue 3, 2003, Pages 2136-2138

  Mathiot, D ^a   Schunck, J P ^a   Perego, M ^b   Fanciulli, M ^b   Normand, P ^c   Tsamis, C ^c   Tsoukalas, D ^c  

^a Phase CNRS   (France)

^b LABORATORIO MDM   (Italy)

^c INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; INTERDIFFUSION (SOLIDS); INTERFACES (MATERIALS); SECONDARY ION MASS SPECTROMETRY; SILICA; THERMAL DIFFUSION IN SOLIDS;

SELF-DIFFUSION;

SEMICONDUCTING SILICON;

EID: 0043011900     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1589168     Document Type: Article

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