A kinetic model to study film deposition during dusty plasma chemical vapor deposition process

Journal of Applied Physics

Volumn 105, Issue 6, 2009, Pages

  Rovagnati, B ^a   Mashayek, F ^a  

^a 1120 Science and Engineering Offices   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC PLASMAS; BOTTOM ELECTRODES; CIRCULAR OBJECTS; DEPOSITED FILMS; DUSTY PLASMAS; EXPERIMENTAL OBSERVATIONS; FILM DEPOSITIONS; ISOTROPIC PLASMAS; KINETIC MODELS; NON-UNIFORM; NUMERICAL KINETIC MODELS; TWO-DIMENSIONAL GEOMETRIES;

CHEMICAL VAPOR DEPOSITION; DUST; ELECTRODEPOSITION; ION BOMBARDMENT; IONS; KINETIC THEORY; PLASMA THEORY; SEMICONDUCTOR PLASMAS; SURFACE DIFFUSION; TWO DIMENSIONAL; VAPORS;

PLASMA DEPOSITION;

EID: 63749092928     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3088875     Document Type: Article

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