Gas discharge plasmas and their applications

Spectrochimica Acta - Part B Atomic Spectroscopy

Volumn 57, Issue 4, 2002, Pages 609-658

  Bogaerts, Annemie ^a   Neyts, Erik ^a   Gijbels, Renaat ^a   Van der Mullen, Joost ^b  

^a UNIVERSITY OF ANTWERP   (Belgium)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Dielectric barrier discharge; Direct current; Gas discharge; Lamps; Lasers; Magnetron; Plasma; Plasma display panels; Pulsed; Radio frequency; Surface modification

Indexed keywords

GLOW DISCHARGES; IONIZATION OF GASES; PLASMA DISPLAY DEVICES; SURFACE TREATMENT;

GAS DISCHARGE PLASMAS;

INDUCTIVELY COUPLED PLASMA;

EID: 0037023121     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0584-8547(01)00406-2     Document Type: Review

References (196)

1. Two-dimensional hybrid model of low-pressure glow discharges
2. Comparison of modeling calculations with experimental results for rf glow discharge optical emission spectrometry
3. Electron heating in low pressure rf glow discharges
4. An investigation of the sparking potential of a HF discharge in a gas in the transition range of frequencies and pressures
5. Ion bombardment secondary electron maintenance of steady rf discharges
6. Alpha and gamma rf capacitive discharges at intermediate pressures
7. Transition between different regimes of rf glow discharges
8. Evolution of the electron energy distribution function during rf discharge transition to the high voltage mode
9. Discontinuous transitions between alpha and gamma regimes of rf capacitive discharge
10. Plasma generation and plasma sources
11. Microsecond-pulse glow discharge atomic emission
12. Quantitative depth analysis using microsecond pulsed glow discharge atomic emission spectrometry
13. Modelling the pulsed glow discharge of a nitriding reactor
14. Dynamics of a pulsed DC discharge used for plasma-assisted chemical vapor deposition: A case study for titanium nitride deposition
15. The glow discharge at low pressure
16. High-pressure hollow cathode discharges
17. Direct current high-pressure glow discharges
18. Direct current glow discharges in atmospheric air
19. Emission studies on a glow discharge in atmospheric pressure air using water as a cathode
20. Pressure dependence of the atmospheric electrolyte cathode glow discharge spectrum
21. An atmospheric pressure dc glow discharge on a microchip and its application as a molecular emission detector
22. A dc microplasma on a chip employed as an optical emission detector for gas chromatography
23. Atmospheric pressure capactively coupled plasma spectral lamp and source for the direct analysis of conducting solid samples
24. Atmospheric pressure helium rf plasma source for atomic and molecular mass spectrometry
25. Atmospheric pressure capacitively coupled plasma source for the direct analysis of non-conducting solid samples
26. Stable glow plasma at atmospheric pressure
27. Appearance of a stable glow discharge in air, oxygen and nitrogen at atmospheric pressure using a 50 Hz source
28. Experimental and theoretical study of a glow discharge at atmospheric pressure controlled by dielectric barrier
29. Glow plasma treatment at atmospheric pressure for surface modification and film deposition
30. The mechanism of the stabilization of glow plasma at atmospheric pressure
31. A remote exposure reactor for plasma processing and sterilization by plasma active species at one atmosphere
32. Images of biological samples undergoing sterilization by a glow discharge at atmospheric pressure
33. Synthesis of plasma-polymerized tetra-ethoxylane and hexamethyldisiloxane films prepared by atmospheric pressure glow discharge
34. Application of atmospheric pressure dielectric barrier discharges in deposition, cleaning and activation
35. Raising of ozone formation efficiency in a homogeneous glow discharge plasma at atmospheric pressure
36. From ozone generators to flat television screens: History and future potential of dielectric-barrier discharges
37. The development of dielectric barrier discharges in gas gaps and on surfaces
38. Modelling and application of silent discharge plasmas
39. Microdischarges in air-fed ozonizers
40. On various kinds of dielectric barrier discharges
41. Ozone synthesis from oxygen in dielectric barrier discharges
42. Synthesis of ozone in barrier discharges
43. The dielectric barrier discharge - A powerful microchip plasma for diode laser spectrometry
44. The influence of electrode geometry and gas flow on corona-to-glow and glow-to-spark threshold currents in air
45. Streamer mechanism for negative corona current pulses
46. The theory of positive glow corona
47. Cylindrical magnetron discharges. I. Current-voltage characteristics for dc and rf driven discharge sources
48. Charged particle fluxes from planar magnetron sputtering sources
49. On the theory of low-pressure magnetron glow discharges
50. Design advances and applications of the rotatable cylindrical magnetron
51. Advances in magnetron sputter sources
52. Design of high density plasma sources for materials processing
53. Plasma discharges for materials processing and display applications
54. ECR plasmas for thin-film deposition
55. Electron cyclotron resonance microwave discharges for etching and thin-film deposition
56. ECR plasma sources
57. Review of inductively coupled plasmas for plasma processing
58. Novel low power/reduced pressure inductively coupled plasma ionization source for mass spectrometric detection of organotin species
59. Electrodeless gas discharges for lighting
60. A cavity for microwave induced plasmas operated in helium and argon at atmospheric pressure
61. 010 cavity as an excitation source for emission spectrometric analysis of solutions
62. An atmospheric pressure waveguide-fed microwave plasma torch: The TIA design
63. On the atomic state densities of plasmas produced by the 'torche à injection axiale'
64. On the electron temperatures and densities in plasmas produced by the 'torche à injection axiale'
65. A microwave plasma torch assembly for atomic emission spectrometry
66. Photographic plasma images and electron number density as well as electron temperature mappings of a plasma in a modified microwave plasma torch (MPT) measured by spatially resolved Thomson scattering
67. Steep plasma gradients studied with spatially resolved Thomson scattering measurements
68. Temperature and electron density measurements in a helium/hydrogen capacitively coupled microwave plasma
69. 2 and air as working gases for atomic spectrometric elemental determinations in aqueous solutions and oils
70. Tubular electrode torch for capacitively coupled helium microwave plasma as a spectrochemical excitation source
71. Investigations of halogen determination in a helium capacitively coupled microwave plasma atomic emission spectrometer
72. A low power 2.45 GHz microwave induced helium plasma source at atmospheric pressure based on microstrip technology
73. A new low-power microwave plasma source using microstrip technology for atomic emission spectrometry
74. The development and use of surface-wave sustained discharges for applications
75. Plasma sources based on the propagation of electromagnetic surface waves
76. Electric field in surface-wave-produced plasmas
77. Production of ions in open-ended region of coaxial-type microwave cavity
78. Investigations of the 147 nm radiative efficiency of Xe surface wave discharges
79. A high-frequency surface wave pumped He-Ne laser
80. Innovative surface wave plasma reactor technique for PFC abatement
81. Very low-roughness diamond film deposition using a surface-wave-sustained plasma
82. Etch characterization of a large diameter ECR process reactor supplied by a surface-wave-sustained plasma source
83. Taming the surfatron
84. The behavior of heavy particles in the expanding plasma jet in argon
85. Optical and mechanical properties of plasma-beam deposited amorphous hydrogenated carbon
86. Plasma chemistry aspects of a-Si:H deposition using an expanding thermal plasma
87. Dusty plasmas: Fundamental aspects and industrial applications
88. Derivation and experimental verification of a particulate transport model for a glow discharge
89. Theoretical overview of the large-area plasma processing system (LAPPS)
90. Plasma-aided manufacturing
91. Structural properties of a-Si:H related to ion energy distributions in VHF silane deposition plasmas
92. Deposition properties and applications of carbon-based coatings
93. Carbon thin films
94. Triple-junction amorphous silicon alloy solar cell with 14.6% initial and 13% stable conversion efficiency
95. Optical properties and applications of diamond-like carbon coatings
96. Commercial applications of ion beam deposited diamond-like carbon (DLC) coatings
97. Applications of diamond-like carbon thin films
98. Amorphous hydrogenated carbon (a-C:H) for optical, electrical and mechanical applications
99. Pulse-time modulated plasma discharge for highly selective, highly anisotropic and charge-free etching
100. Energy dependence of the ion-induced sputtering yields of monoatomic solids
101. Ion- and electron-assisted gas-surface chemistry - An important effect in plasma etching
102. Metal ion implantation: Conventional versus immersion
103. Plasma ion implantation technology for broad industrial application
104. Plasma immersion ion implantation doping experiments for microelectronics
105. Plasma source ion implantation technique for surface modification of materials
106. Plasma Polymerization
107. Plasma chemistry of polymers
108. Fluorescent lamps
109. Variable color temperature fluorescence lamp
110. Nonuniformities in glow discharges: Cataphoresis
111. Absorption measurements on a low pressure, inductively coupled argon/mercury discharge for lighting purposes: 1. The gas temperature and argon metastable densities
112. Electrodeless lamps
113. Development of the electrodeless fluorescent lamp
114. Applications of microwave discharges to high power light sources
115. Plasma displays
116. Plasma displays
117. Two-dimensional simulation of an alternating current matrix plasma display cell: Cross-talk and other geometric effects
118. A new active-matrix technique using plasma addressing
119. A self-consistent model for the discharge kinetics in a high-repetition-rate copper-vapor laser
120. Laser systems for photodynamic therapy
121. 3 laser
122. Ion lasers: The early years (invited paper)
123. Model of cw argon ion lasers excited by low-energy electron beams
124. Hollow cathode metal ion lasers
125. High-gain hollow-cathode metal ion lasers for the UV and VUV
126. Hollow cathode discharges for gas lasers
127. Kinetics modeling of a pulsed Cu-Ne discharge: Potential for new ultraviolet laser transitions in CuII
128. + laser
129. High beam quality UV lasers for microelectronics
130. 2 laser
131. 2 gas laser
132. Applications of plasma technology in environmental techniques
133. Thermal plasmas
134. Gas phase corona discharges for oxidation of phenol in an aqueous solution
135. 2 from flue gas
136. Decomposition of carbon tetrachloride by a packed bed plasma reactor
137. Comparison of pulsed corona and electron beam processing of hazardous air pollutants
138. 2 gas mixtures by corona radical shower systems
139. Study of volatile organic compounds destruction by dielectric barrier corona discharge
140. Water purification by electrical discharges
141. Review: Effect of pulsed electrical fields on the quality of food products
142. Degradation of 4-chlorophenol, 3, 4-dichloroaniline and 2, 4, 6-trinitrotoluene in an electrohydraulic discharge reactor
143. Detoxication of trichloroethylene in a low-pressure wave plasma
144. Sterilization of contaminated matter with an atmospheric pressure plasma
145. Room temperature sterilization of surfaces and fabrics with a one atmosphere uniform glow discharge plasma
146. Use of a one atmosphere uniform glow discharge plasma to kill a broad spectrum of microorganisms
147. Design and characteristics of SIPPI, an ion source for a long-distance SIMS analysis of the Phobos surface
148. Characteristics of a surfatron driven ion source
149. Exotic instruments and applications of laser ionization mass spectrometry in space research
150. Metastable argon beam source using a surface wave sustained plasma
151. Active species in microwave postdischarge for steel-surface nitriding
152. The influence of atomic nitrogen flux on the composition of carbon nitride thin films