Atomistic simulation study of the interactions of SiH3 radicals with silicon surfaces

Journal of Applied Physics

Volumn 86, Issue 5, 1999, Pages 2872-2888

  Ramalingam, Shyam ^a   Maroudas, Dimitrios ^a   Aydil, Eray S ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001599763     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371136     Document Type: Article

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