EUV resist based on low molecular weight PHS

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Shirai, Masamitsu ^a   Kurosima, Akitaka ^a   Okamura, Haruyuki ^a   Kaneyama, Koji ^b   Itani, Toshiro ^b  

^a Osaka City University   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

EUV resist; Imino sulfonate; Non chemically amplified resist; Polyhydroxystyrene; Polyvinylphenol

Indexed keywords

COPOLYMERIZATION; MOLECULAR WEIGHT; MOLECULAR WEIGHT DISTRIBUTION; MONOMERS; PHOTORESISTORS; PHOTORESISTS; PHOTOSENSITIZERS; POLYMERS; SILANES; ULTRAVIOLET DEVICES;

EUV RESIST; IMINO SULFONATE; NON-CHEMICALLY AMPLIFIED RESIST; POLYHYDROXYSTYRENE; POLYVINYLPHENOL;

ANIONIC POLYMERIZATION;

EID: 57349150254     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771774     Document Type: Conference Paper

References (9)

1. A. Silva, D. Forman, C. K. Ober, Proc. SPIE, 6153, 615341 (2006).
2. C, Vannuffel, D. Djian, S. Tedesco, D. Niakoula, P. Argitis, V. Vidali, E. Couladouros, H. Solak, Proc. SPIE, 6519, 651949 (2007).
3. K. Gonsalves, M. Thiyagarajan, K. Dean, P. Santiago, L. Redon, A. Jeyakumuar, C. Henderson, Proc. SPIE, 5753, 467 (2005).
4. M. Thiyagarajan, K. Dean, K. Gonsalves, J. Photopolym. Sci. Technol., 18, 737 (2005).
5. M. Shirai, M. Tsunooka, M. Tanaka, J. Polym. Sci. Part A: Polym. Chem., 11, 325 (1989).
6. H. Ito, A. Knebelkamp, S. B. Lundmark, C. V. Nguen, W. D. Hinsberg, J. Polym. Sci., Part A: Polym. Chem., 38, 2415 (2000).
7. M. Shirai, M. Tsunooka, M. Tanaka, Bull Chem. Soc. Jpn., 71, 2483 (1998).
8. K. Dean, K. Gonsalves, M. Thiyagarajan, Proc. SPIE, 6153, 61531E (2006).
9. J. J. Santilla, M. Toriumi, T. Itani, Proc, SPIE, 6519, 651944 (2007).