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Volumn 6923, Issue , 2008, Pages
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EUV resist based on low molecular weight PHS
a
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Author keywords
EUV resist; Imino sulfonate; Non chemically amplified resist; Polyhydroxystyrene; Polyvinylphenol
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Indexed keywords
COPOLYMERIZATION;
MOLECULAR WEIGHT;
MOLECULAR WEIGHT DISTRIBUTION;
MONOMERS;
PHOTORESISTORS;
PHOTORESISTS;
PHOTOSENSITIZERS;
POLYMERS;
SILANES;
ULTRAVIOLET DEVICES;
EUV RESIST;
IMINO SULFONATE;
NON-CHEMICALLY AMPLIFIED RESIST;
POLYHYDROXYSTYRENE;
POLYVINYLPHENOL;
ANIONIC POLYMERIZATION;
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EID: 57349150254
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.771774 Document Type: Conference Paper |
Times cited : (8)
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References (9)
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