Deposition and characterization of non-isostructural (Ti0.7Al0.3N)/(Ti0.3Al0.7N) multilayers

Surface and Coatings Technology

Volumn 203, Issue 9, 2009, Pages 1176-1181

  Tentardini, E K ^a   Kwietniewski, C ^b   Perini, F ^a   Blando, E ^c   Hubler R ^c   Baumvol, I J R ^a,b  

^a UNIVERSITY OF CAXIAS DO SUL   (Brazil)

^b FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^c PONTIFICAL CATHOLIC UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

Author keywords

H3 E2 ratio; Hardness and elastic modulus; Magnetron sputtering; Non isostructural nanoscale multilayers; Thin films; TiAlN

Indexed keywords

ALUMINUM; COATINGS; ELASTIC MODULI; ELECTRIC DISCHARGES; FILM PREPARATION; GLOW DISCHARGES; HARDNESS; MAGNETRONS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; NITRIDES; NUCLEAR REACTORS; PROTECTIVE COATINGS; THIN FILMS; WEAR RESISTANCE;

DC MAGNETRON SPUTTERING; GLOW DISCHARGE OPTICAL SPECTROSCOPIES; H3/E2 RATIO; MEDIUM ENERGIES; METAL NITRIDES; NANOSTRUCTURED COATINGS; NON-ISOSTRUCTURAL NANOSCALE MULTILAYERS; PRESENT STAGES; RESONANT NUCLEAR REACTIONS; STEEL SUBSTRATES; SUPER HARDNESSES; TIALN; TRIBOLOGICAL PROPERTIES; X-RAY DIFFRACTIONS;

MULTILAYERS;

EID: 58149490958     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.10.014     Document Type: Article

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