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Volumn 190, Issue 1-4, 2002, Pages 538-542

Narrow nuclear resonance profiling of Al with subnanometric depth resolution

Author keywords

Aluminum profile; Nuclear reactions; Si substrate; Ultrathin Al2O3 films

Indexed keywords

ALUMINUM COMPOUNDS; DEPOSITION; RAPID THERMAL ANNEALING; RESONANCE; SCATTERING; SPUTTERING; SUBSTRATES; TRANSPORT PROPERTIES; ULTRATHIN FILMS;

EID: 0036569361     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(01)01173-9     Document Type: Conference Paper
Times cited : (5)

References (8)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.