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Volumn 190, Issue 1-4, 2002, Pages 538-542
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Narrow nuclear resonance profiling of Al with subnanometric depth resolution
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Author keywords
Aluminum profile; Nuclear reactions; Si substrate; Ultrathin Al2O3 films
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Indexed keywords
ALUMINUM COMPOUNDS;
DEPOSITION;
RAPID THERMAL ANNEALING;
RESONANCE;
SCATTERING;
SPUTTERING;
SUBSTRATES;
TRANSPORT PROPERTIES;
ULTRATHIN FILMS;
NUCLEAR RESONANCE;
NUCLEAR PHYSICS;
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EID: 0036569361
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-583X(01)01173-9 Document Type: Conference Paper |
Times cited : (5)
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References (8)
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