Mechanical and tribe-logical properties of titanium-aluminium-nitride films deposited by reactive close-field unbalanced magnetron sputtering

Wear

Volumn 257, Issue 9-10, 2004, Pages 1030-1040

  Shum, P W ^a   Tam, W C ^a   Li, K Y ^a   Zhou, Z F ^a   Shen, Y G ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Dynamic impact test; Hardness; Raman spectroscopy; Reactive close field unbalanced magnetron sputtering; Residual stress; Ti Al N thin films; Wear

Indexed keywords

COMPRESSIVE STRESS; DEPOSITION; HARDENING; IMPACT TESTING; INDENTATION; LIGHT INTERFERENCE; MAGNETRON SPUTTERING; MIXTURES; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; TITANIUM COMPOUNDS; TRIBOLOGY; WEAR OF MATERIALS; X RAY PHOTOELECTRON SPECTROSCOPY;

CYCLIC IMPACT TESTERS; ROOM TEMPERATURE; SCRATCH TESTERS; TITANIUM ALUMINUM NITRIDE; WEAR TESTERS;

THIN FILMS;

FILM LUBRICANT; HARDNESS; TESTING METHOD; TRIBOLOGY; WEAR DEBRIS; WEAR PREVENTION;

EID: 5544228164     PISSN: 00431648     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.wear.2004.07.014     Document Type: Article

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