Enhanced stability of rocksalt-type AIN phase in AIN/TiN superlattices synthesized by room-temperature pulsed laser deposition

Journal of Applied Physics

Volumn 92, Issue 8, 2002, Pages 4255-4260

  Pankov, V ^a   Evstigneev, M ^a   Prince, R H ^a  

^a YORK UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ALN; ALN LAYERS; BILAYER THICKNESS; COHERENT GROWTH; CRITICAL VALUE; DEPOSITION TECHNIQUE; ENHANCED STABILITY; HARDNESS ENHANCEMENT; KOEHLER; NON EQUILIBRIUM; ROCK SALT; ROOM TEMPERATURE; SUPERLATTICE COATINGS; TIN LAYERS; WURTZITES;

COATINGS; HARDNESS; PULSED LASER DEPOSITION; SODIUM CHLORIDE; TITANIUM NITRIDE; ZINC SULFIDE;

SUPERLATTICES;

EID: 18744411778     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1506398     Document Type: Article

References (25)

1. J. S. Koehler, Phys. Rev. B 2, 547 (1970). prq PLRBAQ 0556-2805
2. M. Setoyama, M. Irie, H. Ohara, M. Tsujioka, Y. Takeda, T. Nomura, and N. Kitagawa, Thin Solid Films 341, 126 (1999). tsf THSFAP 0040-6090
3. M. Setoyama, A. Nakayama, M. Tanaka, N. Kitagawa, and T. Nomura, Surf. Coat. Technol. 86, 225 (1996). sct SCTEEJ 0257-8972
4. Y. Y. Wang, M. S. Wong, W. J. Chia, J. Rechner, and W. D. Sproul, J. Vac. Sci. Technol. A 16, 3341 (1998). jva JVTAD6 0734-2101
5. M. -S. Wong, G.-Y. Hsiao, and S.-Y. Yang, Surf. Coat. Technol. 133, 160 (2000). sct SCTEEJ 0257-8972
6. X. Chu and S. A. Barnett, J. Appl. Phys. 77, 4403 (1995). jap JAPIAU 0021-8979
7. A. Madan, I. W. Kim, S. C. Cheng, P. Yashar, V. P. Dravid, and S. A. Barnett, Phys. Rev. Lett. 78, 1743 (1997). prl PRLTAO 0031-9007
8. T. Mashimo, M. Uchino, A. Nakamura, T. Kobayashi, E. Takasawa, T. Sekine, Y. Noguchi, H. Hikosaka, K. Fukuoka, and Y. Syono, J. Appl. Phys. 86, 6710 (1999). jap JAPIAU 0021-8979
9. Z.-M. Ren, Y.-F. Lu, Y.-W. Chong, M.-L. Ng, J.-P. Wang, B.-A. Cheong, and T.-Y. Liew, Jpn. J. Appl. Phys., Part 2 39, L423 (2000). jjc JAPLD8 0021-4922
10. V. Pankov, M. Evstigneev, and R. H. Prince, J. Vac. Sci. Technol. A 20, 430 (2002). jva JVTAD6 0734-2101
11. H. P. Klug and L. E. Alexander, X-ray Diffraction Procedures (Wiley, New York, 1974).
12. P. H. Townsend, D. M. Barnett, and T. A. Brunner, J. Appl. Phys. 62, 4438 (1987). jap JAPIAU 0021-8979
13. H. P. Liaw and R. F. Davis, J. Electrochem. Soc. 131, 3014 (1984). jes JESOAN 0013-4651
14. E. Hurtós and J. Rodríguez-Viejo, J. Appl. Phys. 87, 1748 (2000). jap JAPIAU 0021-8979
15. Joint Committee on Powder Diffraction Standards, JCPDS file 38-1420.
16. Joint Committee on Powder Diffraction Standards, JCPDS file 25-1133.
17. Joint Committee on Powder Diffraction Standards, JCPDS file 46-1200.
18. X. L. Ma, N. Shibata, and Y. Ikuhara, J. Mater. Res. 14, 1597 (1999). jmr JMREEE 0884-2914
19. G. Koren, A. Gupta, and R. J. Baseman, Appl. Phys. Lett. 54, 19 (1989). apl APPLAB 0003-6951
20. D. B. Geohegan, Appl. Phys. Lett. 62, 1464 (1993). apl APPLAB 0003-6951
21. D. H. A. Blank, G. Koster, G. Rinjnders, E. van Setten, P. Slycke, and H. Rogalla, Appl. Phys. A: Mater. Sci. Process. 69, S17 (1999). mfc APAMFC 0947-8396
22. P. Yashar, X. Chu, S.A. Barnett, J. Rechner, Y. Y. Wang, M. S. Wong, and W. D. Sproul, Appl. Phys. Lett. 72, 987 (1998). apl APPLAB 0003-6951
23. N. E. Chrystensen and I. Gorczyca, Phys. Rev. B 47, 4307 (1993). prb PRBMDO 0163-1829
24. A. Karimi, O. R. Shojaeti, T. Kruml, and J. L. Martin, Thin Solid Films 308, 334 (1997). tsf THSFAP 0040-6090
25. E. Torok, A. P. Perry, L. Chollet, and W. D. Sproul, Thin Solid Films 153, 37 (1987). tsf THSFAP 0040-6090