Control of microstructures and properties of dc magnetron sputtering deposited chromium nitride films

Vacuum

Volumn 82, Issue 5, 2008, Pages 501-509

  Zhang, Z G ^a,b   Rapaud, O ^b   Bonasso, N ^b   Mercs, D ^b   Dong, C ^a   Coddet, C ^b  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b UNIVERSITÉ DE TECHNOLOGIE DE BELFORT MONTBÉLIARD   (France)

Author keywords

Adhesion; Control; Cr N coatings; DC magnetron sputtering; Tribology

Indexed keywords

ARGON; CHROMIUM COMPOUNDS; MAGNETRON SPUTTERING; NITROGEN; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION;

CHROMIUM NITRIDE FILMS; NITROGEN FLOW RATE CURVES; NITROGEN-ARGON MIXED ATMOSPHERES; SPUTTERING PRESSURE;

MICROSTRUCTURE;

EID: 37049003955     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2007.08.009     Document Type: Article

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