Contact electrochemical replication of hydrophilic - Hydrophobic monolayer patterns

ACS Nano

Volumn 2, Issue 12, 2008, Pages 2554-2568

  Zeira, Assaf ^a   Chowdhury, Devasish ^a,b   Maoz, Rivka ^a   Sagiv, Jacob ^a  

^a WEIZMANN INSTITUTE OF SCIENCE   (Israel)

^b INDIAN INSTITUTE OF TECHNOLOGY GUWAHATI   (India)

Author keywords

AFM; Electrochemistry; Hydrogels; Monolayer patterning; Organosilane monolayers; Pattern replication; Surface wetting

Indexed keywords

ATOMIC FORCE MICROSCOPY; COLLOIDS; ELECTROCHEMISTRY; ELECTROLYSIS; ELECTROLYTES; HYDROGELS; HYDROPHILICITY; HYDROPHOBICITY; MONOLAYERS; SELF ASSEMBLED MONOLAYERS; SEMICONDUCTING SILICON COMPOUNDS; SILANES; SILICON WAFERS; SURFACE CHEMISTRY; SURFACE TENSION; TARGETS; WETTING;

AFM; AQUEOUS ELECTROLYTES; ELECTROCHEMICAL PRINTINGS; ELECTROCHEMICAL REPLICATIONS; ELECTROCHEMICAL TRANSFERS; ELECTROLYTE BRIDGES; HYDROPHILIC DOMAINS; HYDROPHOBIC MONOLAYERS; HYDROPHOBIC SURFACES; INFORMATION TRANSFERS; LIQUID WATERS; MONOLAYER SURFACES; NANOMETRIC; NON VOLATILES; NOVEL PATTERNS; ORGANOSILANE MONOLAYERS; PATTERN REPLICATION; SILICON WAFER SURFACES; SURFACE WETTING; VOLTAGE BIASES;

ELECTRON ENERGY LEVELS;

NANOMATERIAL; WATER;

ARTICLE; CHEMISTRY; ELECTROCHEMISTRY; HYDROPHOBICITY; METHODOLOGY; NANOTECHNOLOGY;

ELECTROCHEMISTRY; HYDROPHOBICITY; NANOSTRUCTURES; NANOTECHNOLOGY; WATER;

EID: 58149166586     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn8005174     Document Type: Article

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